Genesis Stand-Alone Marangoni Dryer
Wafer Drying Utilizing Advanced Hardware, Process Understanding & Software Execution
Wafer drying is completed while minimizing contact to production wafers. The Genesis utilizes a proprietary design to ensure the face of the wafer is not contacting the Teflon cassette during the dry cycle.
Features and Benefits:
Improve Yield, Reduce Particles RENA’s integrated Marangoni Dryer provides superior performance by utilizing:
- Manually loaded cassettes or optional automated wafer handling with robot
- Teflon cassettes
- Substrates are free of watermarks after drying
- Enables chemical cleaning before drying with no air interface
- Will not damage sensitive photo resist layers during dry
- Typical cycle times 7-20 minutes
- Dries phobic or philic surfaces
- Host compatible
- Optional chemical injection
- IPA usage 20ml per dry cycle
- Wafer size solutions for 50mm – 200m
- CE marked
Robust, Efficient, Clean & Cost Effective
Varying Dryer Designs Match Varying Needs
- Integrated DI water filtration option
- Optional IPA recirculation for more robust particle performance
- Low cost of ownership
Contact our Experts
We are happy to help our customers find efficient and process-optimized solutions for their wet processing applications.