Genesis Marangoni Dryer
RENA’s Genesis Marangoni Dryer integrates drying with cleaning and rinsing, providing a one-step process for applications including the fabrication and cleaning of ICs, solar cells, fuel cells, and MEMS. The entire process is monitored and controlled by RENA’s proprietary IDX Process Control software.
Features and Benefits:
- Robust, Efficient & Clean
- Cost Effective
- Recirculating for reduced IPA usage
- Low cost of ownership
- Enables Dry In – Dry Out Processing
- Simplified Marangoni dryer design
- Teflon cassettes @ > 200nm w/5mm
- Static wafer lifter
- Hydrophobic or Philic surfaces
- Particle performance
- Uses Teflon cassettes
- Ideal for drying thin wafers
- Typical 7-20 min cycle time
- Will not damage photoresist
Available in the Revolution & Advancer Wet Bench
Intuitive Integration
- Active lifter for independent wafer
- Low mass carrier drying @ 30nm w/3mm EE
- Slow pull wafer lifter
- Wafers dried independently of the carrier
- Phobic or Philic surfaces
- Particle performance
- Uses low mass wafer carrier
- Optional IPA recirculation & filtration to 15nm
- Typical 10 min cycle time
- Will not damage photoresist
- Produces oxide-free H terminated surface with no air interface
- HF injection is best used for complete oxide strip applications
- Combination HF, HCl, and DIO3 rinse provides high-quality surfaces
- Cycle times are application dependent
- O3, HF, or HCl Injection for Critical Clean Applications
Available in RENA NA’s Flagship Wet Bench, the Evolution
